发明名称 SPIRAL COATING APPARATUS
摘要 According to one embodiment, a spiral coating apparatus includes: a stage; a nozzle; a movement unit; a gas supply unit; a cleaning liquid supply unit; and a nozzle cleaner. The stage has a placement surface. The nozzle is configured to dispense a liquid onto a coating object placed on the stage. The movement unit is configured to move the nozzle relative to the stage. The gas supply unit is configured to supply a gas. The cleaning liquid supply unit is configured to supply a cleaning liquid. The nozzle cleaner has a gas supply port and a cleaning liquid supply port. The nozzle cleaner is configured to force the gas supplied by the gas supply unit from the gas supply port toward the nozzle and dispense the cleaning liquid supplied by the cleaning liquid supply unit from the cleaning liquid supply port toward the nozzle.
申请公布号 US2015075423(A1) 申请公布日期 2015.03.19
申请号 US201414456016 申请日期 2014.08.11
申请人 Kabushiki Kaisha Toshiba 发明人 KISHI Toshiyuki;Fuchikami Yasuhiko;Ooshiro Kenichi
分类号 B05B15/02;B05B3/18;B05C11/08;B05C5/02 主分类号 B05B15/02
代理机构 代理人
主权项 1. A spiral coating apparatus, comprising: a stage having a placement surface configured to have a coating object placed on the placement surface; a nozzle configured to dispense a liquid onto the coating object placed on the stage; a movement unit configured to move the nozzle relative to the stage, the movement unit including a first movement mechanism part and a second movement mechanism part, the first movement mechanism part being configured to move the nozzle in a direction parallel to a rotational axis of the stage, the second movement mechanism part being configured to move the nozzle along the placement surface in a direction intersecting the rotational axis; a gas supply unit configured to supply a gas; a cleaning liquid supply unit configured to supply a cleaning liquid; and a nozzle cleaner having a gas supply port and a cleaning liquid supply port, the nozzle cleaner being configured to force the gas supplied by the gas supply unit from the gas supply port toward the nozzle and dispense the cleaning liquid supplied by the cleaning liquid supply unit from the cleaning liquid supply port toward the nozzle.
地址 Minato-ku JP