| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a resist pattern or a conductive pattern on a decorative substrate, by which generation of bubbles is prevented upon forming a resist pattern or a conductive pattern on a decorative substrate having a stepped portion, and a transfer type photosensitive conductive film that can be suitably used for the above method.SOLUTION: A method for laminating a photosensitive film on a decorative substrate is provided, in which a photosensitive film including a support film, a photosensitive layer disposed on the support film, and a protective film disposed on the photosensitive layer is laminated, after the protective film is removed, on a decorative substrate by bringing the photosensitive layer into contact with the substrate. The protective film is an embossed film. The decorative substrate has a stepped portion; and the photosensitive layer has a thickness equal to or larger than the step height of the decorative substrate. |
