WAFER-SHAPED TOOL CONFIGURED TO MONITOR PLASMA CHARACTERISTICS AND PLASMA MONITORING SYSTEM USING THE SAME

摘要

Provided are tools and systems to monitor plasma characteristics. The tool may include a housing, and a sensor array, a signal processor, and a data-transferring device provided in the housing. The sensor array may include a plurality of measurement sensors two-dimensionally arranged in the housing, each of the measurement sensors including a shielding layer configured to prevent an electrical interaction with charged particles in plasma, the signal processor may be configured to process electrical signals produced by the measurement sensors, and thereby generate measurement data, and the data-transferring device may be configured to transmit the measurement data to the outside.

主权项

1. A plasma monitoring tool, comprising:
a housing; and a sensor array, a signal processor, and a data-transferring device, each of the sensor array, the signal processor, and the data-transferring device being provided in the housing, wherein the sensor array comprises a plurality of measurement sensors two-dimensionally arranged in the housing, each of the measurement sensors comprising a shielding layer configured to prevent an electrical interaction with charged particles in plasma, the signal processor is configured to process electrical signals produced by the measurement sensors, and thereby generate measurement data, and the data-transferring device is configured to transmit the measurement data to the outside.