发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a 4-terminal tunnel FinFET which can modulate a threshold voltage without increasing an off-state current.SOLUTION: A 4-terminal tunnel FinFET is composed of a source part S and a drain part D which sandwich a channel part C in an x direction, and a driving gate G1 and a Vth control gate G2 which sandwich the channel part C in a y direction orthogonal to the x direction. The source part S is composed of a second source part S2 which lies on the driving gate G1 side and has a relatively high concentration (10-10cm), and a first source part S1 which lies on the Vth control gate G2 side and has a relatively low concentration (10-10cm). The second source part S2 provided on the driving gate G1 side prevents decrease in tunneling probability and the first source part S1 provided on the Vth control gate G2 side modulates a threshold voltage without increasing an off-state current.
申请公布号 JP2015053453(A) 申请公布日期 2015.03.19
申请号 JP20130186693 申请日期 2013.09.09
申请人 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY 发明人 MIZUBAYASHI WATARU;MASAHARA MEISHOKU;FUKUDA KOICHI
分类号 H01L29/786;H01L21/28;H01L21/336;H01L29/66 主分类号 H01L29/786
代理机构 代理人
主权项
地址