发明名称 |
CRUCIBLE FOR VAPOR DEPOSITION, VAPOR DEPOSITION APPARATUS AND VAPOR DEPOSITION METHOD |
摘要 |
Provided are a crucible for vapor deposition, a vapor deposition apparatus and a vapor deposition method capable of detecting a film formation rate using a sensor in vapor deposition by proximity vapor deposition. The crucible according to the present invention includes a storage section that stores a vapor deposition source, a first guide passage that guides a vaporized material emitted from the vapor deposition source toward a substrate to be treated, a wall section for defining the first guide passage and a second guide passage that diverges from a middle part of the first guide passage, penetrates the wall section and communicates with the outside. |
申请公布号 |
US2015079274(A1) |
申请公布日期 |
2015.03.19 |
申请号 |
US201214377608 |
申请日期 |
2012.09.11 |
申请人 |
Kakiuchi Ryohei;Yamamoto Satoru |
发明人 |
Kakiuchi Ryohei;Yamamoto Satoru |
分类号 |
C23C14/54;C23C14/50 |
主分类号 |
C23C14/54 |
代理机构 |
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代理人 |
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主权项 |
1. A crucible for vapor deposition comprising:
a storage section that stores a vapor deposition source; a first guide passage that guides a vaporized material emitted from the vapor deposition source toward a substrate to be treated; a wall section for defining the first guide passage; and a second guide passage that diverges from a middle part of the first guide passage, penetrates the wall section and communicates with the outside. |
地址 |
Ibaraki-shi JP |