| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern measuring device and a pattern measuring method, capable of highly accurately measuring a pattern position.SOLUTION: A pattern measuring device includes a scan control unit, a focusing control unit, a stage, a detection unit, a signal processing unit, and a measurement unit. The scan control unit controls an electron beam scanning direction. The focusing control unit controls an electron beam focusing position. A substrate provided with a pattern is placed on the stage. The detection unit detects a secondary electron generated by an electron beam with which the pattern has been irradiated. The signal processing unit processes the signals detected by the detection unit. The signal processing unit obtains a third signal from a first signal and a second signal. The first signal is at least one signal obtained by the detection unit by scanning an electron beam by the scan control unit in a first direction. The second signal is at least one signal obtained by the detection unit by scanning an electron beam by the scan control unit in a second direction opposite to the first direction. The third signal is at least one signal in which a signal difference resulting from a scanning direction of an electron beam is suppressed. The measuring unit measures a pattern location from the third signal. |
