发明名称 |
LAMINATED POLISHING PAD AND METHOD FOR PRODUCING SAME |
摘要 |
A method for manufacturing a laminated polishing pad of the present invention, comprising the steps of: forming a polishing layer by providing a light transmitting region in an opening A of a polishing region; providing an adhesive member X on one side of the polishing layer, wherein the adhesive member X contains a hot-melt adhesive; providing a removable protective member on a part of the adhesive member X corresponding to the light transmitting region; bonding a support layer to the adhesive member X on which the removable protective member is provided; and removing a part of the support layer corresponding to the light transmitting region and also removing the removable protective member to form an opening B. |
申请公布号 |
US2015079879(A1) |
申请公布日期 |
2015.03.19 |
申请号 |
US201314390959 |
申请日期 |
2013.02.28 |
申请人 |
TOYO TIRE & RUBBER CO., LTD. |
发明人 |
Nakamura Kenji |
分类号 |
B24B37/20;B24B37/22;B32B37/18;H01L21/306;B32B38/10 |
主分类号 |
B24B37/20 |
代理机构 |
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代理人 |
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主权项 |
1. A method for manufacturing a laminated polishing pad, comprising the steps of: forming a polishing layer by providing a light transmitting region in an opening A of a polishing region; providing an adhesive member X on one side of the polishing layer, wherein the adhesive member X contains a hot-melt adhesive; providing a removable protective member on a part of the adhesive member X corresponding to the light transmitting region; bonding a support layer to the adhesive member X on which the removable protective member is provided; and removing a part of the support layer corresponding to the light transmitting region and also removing the removable protective member to form an opening B. |
地址 |
Osaka-shi, Osaka JP |