| 发明名称 |
SYSTEM AND METHODS FOR PROCESSING A SUBSTRATE |
| 摘要 |
According to the present disclosure, a substrate processing apparatus for processing a flexible substrate including a vacuum chamber configured for being evacuated and being configured for having a process gas provided therein, a processing module adapted to process the flexible substrate, wherein the processing module is provided within the vacuum chamber, and a discharging assembly configured to generate a flow of charged particles to discharge the flexible substrate is provided. The discharging assembly is configured to generate an electric field for ionizing a processing gas. |
| 申请公布号 |
US2015079271(A1) |
申请公布日期 |
2015.03.19 |
| 申请号 |
US201114364687 |
申请日期 |
2011.12.21 |
| 申请人 |
Hermanns Uwe;Morrison Neil;Stolley Tobias;Hacker Volker |
发明人 |
Hermanns Uwe;Morrison Neil;Stolley Tobias;Hacker Volker |
| 分类号 |
C23C16/503;C23C16/54;C23C16/52 |
主分类号 |
C23C16/503 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A substrate processing apparatus for processing a flexible substrate, comprising:
a vacuum chamber configured for being evacuated and being configured for having a process gas provided therein; a processing module adapted to process the flexible substrate, wherein the processing module is provided within the vacuum chamber; and, a discharging assembly configured to generate a flow of charged particles to discharge the flexible substrate, wherein the discharging assembly is configured to generate an electrical field for ionizing the processing gas. |
| 地址 |
Karlstein Am Main DE |
