Group III Nitride Semiconductor Light-Emitting Device

摘要

The present invention provides a Group III nitride semiconductor light-emitting device exhibiting improved emission performance. A p-electrode comprises a wire bonding portion being connected to a wire, a wiring portion extending in a wiring pattern from the wire bonding portion, and a contact portion being connected to the wiring portion and being in contact with a transparent electrode via holes. A current blocking layer is provided in a specific region between a p-type layer and a transparent electrode. The current blocking layer is formed of an insulating and transparent material with a refractive index lower than that of the p-type layer. Specific region is a region including the contact portion in plan view. The current blocking layer is not provided in regions overlapping with the wire bonding portion and the wiring portion. The current blocking layer is larger by 0 μm to 9 μm in width than the contact portion.

主权项

1. A Group III nitride semiconductor light-emitting device having a transparent electrode, an insulating film, and a p-electrode located in this order on a p-type layer formed of Group III nitride semiconductor, the transparent electrode being electrically connected to the p-electrode via a hole provided in the insulating film, wherein
the p-electrode comprises a connecting portion being electrically connected to the outside of the device, a wiring portion extending in a wiring pattern from the connecting portion, and a contact portion being connected to the wiring portion and being in contact with the transparent electrode via the hole; a current blocking layer made of an insulating and transparent material with a refractive index lower than that of the p-type layer is formed between the p-type layer and the transparent electrode; the current blocking layer is provided in a region including an orthogonal projection of the contact portion in plan view, and is not provided in a region overlapping with the wiring portion; and the current blocking layer is larger by 0 μm to 9 μm in width than the contact portion.