METHOD OF OPERATING A MICROLITHOGRAPHIC PROJECTION APPARATUS

摘要

The invention relates to a method of operating a microlithographic projection exposure apparatus. In a first step (S1) projection objective (20) comprising a plurality of real manipulators (M1, M2, M3) is provided. In a second step (S2) a virtual manipulator is defined that is configured to produce preliminary control signals for at least two of the real manipulators. In a third step (S3) performed during operation of the apparatus a real image error of the projection objective (20) is determined. In a fourth step (S4) a desired corrective effect is determined. In a fifth step (S5) first virtual control signals for the virtual manipulator are determined. In a sixth step (S6) second virtual control signals for the real manipulators are determined. In a seventh step (S7) final control signals for the real manipulators as a function of the first and second virtual control signals are determined. In a eighth step (S8) the final control signals are applied to the real manipulators.