发明名称 |
THIN FILM TRANSISTOR, METHOD OF MANUFACTURING THE SAME, AND DISPLAY DEVICE INCLUDING THE SAME |
摘要 |
A thin film transistor includes a gate electrode which is arranged on a substrate and a gate insulation layer which is arranged on the substrate and covers the gate electrode. An oxide semiconductor pattern includes a channel part which is arranged on the gate insulation layer and overlaps the gate electrode and a low resistance pattern which is formed on the side of the channel part and includes oxygen vacancy. A channel protection layer is arranged on the oxide semiconductor pattern and overlaps the gate electrode. A reactive layer includes metal oxide and covers the oxide semiconductor pattern and the channel protection layer. A source electrode and a drain electrode are in contact with the oxide semiconductor pattern. Parasitic capacitance between the electrodes is blocked by the low resistance pattern. |
申请公布号 |
KR20150029959(A) |
申请公布日期 |
2015.03.19 |
申请号 |
KR20130109052 |
申请日期 |
2013.09.11 |
申请人 |
SAMSUNG DISPLAY CO., LTD. |
发明人 |
HIROSHI OKUMURA;LEE, JE HUN;PARK, JIN HYUN |
分类号 |
H01L21/336;H01L29/786 |
主分类号 |
H01L21/336 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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