| 摘要 |
<p>The present invention provides a trivalent chromium plating bath which comprises an aqueous solution containing a trivalent chromium compound, a complexing agent, a fluoride, aluminum sulfate and a boric acid compound. According to the present invention, a novel trivalent chromium plating bath can be produced, which has a high coating film deposition rate, is suitable for thick plating, and has improved deposition performance in a low current density range and an improved deposition rate.</p> |
