发明名称 |
METHOD OF SURFACE TREATING MICROFLUIDIC DEVICES |
摘要 |
<p>The formation of a barrier layer within individual channels or cavities of a microfluidic device is described. The barrier layer is effected through a gas phase deposition process, desirably implemented in a plasma environment using a gas plasma reactor. Judicious selection of a precursor compound used within the gas plasma reactor can provide for generation of a layer on the individual surfaces. Desirably the surface or barrier layer is generated through the chemical adsorption of a metalloid oxide such as a silicon oxide layer on the surface of the individual channels or cavities.</p> |
申请公布号 |
EP2442908(B1) |
申请公布日期 |
2015.03.18 |
申请号 |
EP20100724520 |
申请日期 |
2010.06.18 |
申请人 |
DUBLIN CITY UNIVERSITY |
发明人 |
GANDHIRAMAN, RAM PRASAD;BASABE-DESMONTS, LOURDES;RIAZ, ASIF;LEE, LUKE;DIMOV, IVAN;DUCREE, JENS;DANIELS, STEPHEN MICHAEL |
分类号 |
B01L3/00;B05D7/22;C23C16/04;C23C16/505 |
主分类号 |
B01L3/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|