发明名称 ウエーハの加工方法
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a wafer processing method capable of easily dividing a wafer into several devices without deteriorating a quality of a device even when a wafer is processed to be thin. <P>SOLUTION: The method includes: a step for grinding a circular recess part 88 having a ring-like reinforcing part 90 around a rear surface of a wafer; a step for forming a plurality of devices blocked by a predetermined division line formed like a lattice on a surface of a wafer corresponding to the circular recess part; a step for attaching an outer periphery of a dicing tape T adhering to the wafer surface to an annular frame F; a step for radiating lasers transmissive to the wafer from a rear surface and focusing them inside the wafer in a device region to form a modified layer; a step for holding the wafer rear surface and radiating the lasers while a focus point is positioned inside the ring-like reinforcing part on an extension line of the predetermined division line from the dicing tape side to form a modified layer inside the ring-like reinforcing part; and a step for applying an external force to the wafer and dividing the wafer into several devices along the predetermined division line. <P>COPYRIGHT: (C)2012,JPO&INPIT</p>
申请公布号 JP5686550(B2) 申请公布日期 2015.03.18
申请号 JP20100193340 申请日期 2010.08.31
申请人 发明人
分类号 H01L21/301;H01L21/304 主分类号 H01L21/301
代理机构 代理人
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