发明名称 MANUFACTURE METHOD FOR SUBSTRATE
摘要 <p>The present invention relates to a method of manufacturing a substrate. An aspect of the present invention is to manufacture a substrate used in semiconductor related fields. The present invention relates to the method of manufacturing the substrate, in which during processes of sequential loading, machining (rough machining, semi-rough machining, finish machining) and measuring, an ABB process or a sanding work (pre-annealing process) is performed in advance as a pre-processing process, while an aging process by a racking process is added, and a post-process of the ABB process or the sanding work is reworked so that a thermal variation of a material is extremely minimized and a precise usability is guaranteed thereby significantly improving the quality of the material.</p>
申请公布号 KR101503814(B1) 申请公布日期 2015.03.18
申请号 KR20140152681 申请日期 2014.11.05
申请人 LEE, JONG RYANG 发明人 LEE, JONG RYANG
分类号 H01L21/02;H01L21/302;H01L21/304;H01L21/66 主分类号 H01L21/02
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