发明名称 |
SURFACE PROTECTIVE TAPE FOR semiconductor wafers for use during BACK GRINDING AND substrate FILM FOR THE SURFACE PROTECTIVE TAPE |
摘要 |
<p>The present invention provides a surface-protection tape for semiconductor wafers having an even thickness accuracy, excellent surface smoothness, and excellent surface sliding properties such as freedom from blocking, etc., and a substrate film for the surface-protection tape. The substrate film for the surface-protection tape for semiconductor wafers has at least one layer containing a polyethylene-based resin and satisfies the following requirements:
(1) the back and front surfaces of the substrate film have a surface roughness Ra measured based on JIS B0601 of not more than 0.8 µm, and at least one surface thereof has a surface roughness Ra of not less than 0.05 µm; and
(2) the difference between the maximum and minimum thicknesses of the substrate film is not more than 4 µm. The present invention also provides a surface-protection tape for semiconductor wafers comprising the substrate film and an adhesive layer.</p> |
申请公布号 |
EP2003685(B1) |
申请公布日期 |
2015.03.18 |
申请号 |
EP20070740832 |
申请日期 |
2007.04.02 |
申请人 |
GUNZE LIMITED;NITTO DENKO CORPORATION |
发明人 |
FUNAZAKI, KOJI;KOJIMA, HISATOMI;HAYASHI, NAOYA;YOKOI, MASAYUKI |
分类号 |
C09J7/02;B32B27/32;H01L21/304;H01L21/683 |
主分类号 |
C09J7/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|