发明名称 シリカ体及びその製造方法
摘要 <P>PROBLEM TO BE SOLVED: To provide a silica body having a low refractive index and excellent adhesion with a base material and the upper layer thereof. <P>SOLUTION: The silica body has the refractive index of &le;1.40, equal to or below 0.05-0.2 g/g difference &Delta; of water vapor adsorption at 20&deg;C in relative water vapor pressure (P/P<SB>0</SB>) of 0.3&le;P/P<SB>0</SB>&le;0.9 (P: water vapor partial pressure and P<SB>0</SB>: saturated water vapor pressure at 25&deg;C) and &le;0.14 g/g water vapor adsorption at 25&deg;C in relative water vapor pressure P/P<SB>0</SB>=0.3. The silica body having refractive index of &le;1.40 is produced by wet-film-forming a silica-based composition containing an alkoxysilane compound, water, an organic solvent and a template material on the base material and after that, heating at &le;220&deg;C. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP5685884(B2) 申请公布日期 2015.03.18
申请号 JP20100234709 申请日期 2010.10.19
申请人 三菱化学株式会社 发明人 山内 律子;山崎 正典;武脇 隆彦;船山 勝矢;大泉 淳一
分类号 C01B33/12;B32B9/00;C03B8/02;C03B19/12;G02B1/11 主分类号 C01B33/12
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