| 发明名称 |
Method of replenishing indium ions in indium electroplating compositions |
| 摘要 |
Methods of replenishing indium ions in indium electroplating compositions are disclosed. Indium ions are replenished during electroplating using indium salts of certain weak acids. The method may be used with soluble and insoluble anodes. |
| 申请公布号 |
EP2848714(A1) |
申请公布日期 |
2015.03.18 |
| 申请号 |
EP20140188931 |
申请日期 |
2009.03.13 |
| 申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS LLC |
发明人 |
SZOCS, EDIT;SCHWAGER, FELIX J.;GAETHKE, THOMAS |
| 分类号 |
C25D3/54;C25D17/10;C25D21/18 |
主分类号 |
C25D3/54 |
| 代理机构 |
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代理人 |
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| 地址 |
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