| 摘要 |
PROBLEM TO BE SOLVED: To form a resist coating film which increases the hydrophobicity of the coating film surface in liquid immersion exposure and also suppresses the occurrence of defects due to a development failure, and moreover has excellent lithographic performance.SOLUTION: There is provided a radiation-sensitive resin composition that contains a polymer component and includes, in the polymer component, a repeating unit (a1) represented by the following formula (1), and at least one repeating unit (f1) selected from the group consisting of repeating units represented by formula (F1-1), formula (F1-2) and formula (F1-3) |
