发明名称 半導体層の製造方法、光電変換装置の製造方法および半導体原料
摘要 <p>Methods for producing a semiconductor layer and for producing a photoelectric conversion device, semiconductor raw material are disclosed. An embodiment of the method for producing a semiconductor layer includes: forming a film containing a metal element and an oxygen element; generating oxygen gas by heating the film; and forming a semiconductor layer containing a metal chalcogenide from the film by allowing the metal element to react with a chalcogen element. Another embodiment of the method includes forming a lower film containing a metal element; forming an upper film, which contains the metal element and a substance that contains oxygen, on the lower film; generating oxygen gas by heating the substance; and forming a semiconductor layer containing a metal chalcogenide from the lower film and the upper film by allowing a chalcogen element to react with the metal element in the lower film and the upper film.</p>
申请公布号 JP5687343(B2) 申请公布日期 2015.03.18
申请号 JP20130522763 申请日期 2012.06.18
申请人 发明人
分类号 H01L21/368;H01L31/18 主分类号 H01L21/368
代理机构 代理人
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