| 摘要 |
<p>The invention relates to a transfer mask (1) for the local vapour deposition of substrates (20) with a transparent intermediate support (2), on the rear face (14) of which a stack of layers (13) is arranged, said stack of layers having an absorber layer (6) of a radiation-absorbing material, on top thereof a continuous cover layer (10) and on top of said cover layer a continuous evaporation layer (12) of the material to be evaporated. In order to be able to evaporate also higher-melting materials with local differentiation, also in a continuous flow process, the stack of layers (13) does not comprise a reflective layer (4) and the mask structure is formed by a structured absorber layer (6) or by a structured reflective layer (4) embedded in the intermediate support (2).</p> |
