| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To enable selecting an illumination angle for enlarging an effective inspection range and excellently detecting defects by suppressing generation of reflection, and to improve irregularity detection ability with improved image contrast between irregularity defect and a normal part by reducing limitations of illumination angle in an irregularity inspection device and method for detecting irregularity defect of an inspected object having a periodic pattern. <P>SOLUTION: A periodic pattern inspection method is an irregularity inspection method for a substrate with a periodic pattern formed on its surface. The substrate is irradiated with illumination light at a plurality of irradiation angles, and an inspection is performed using diffracted light generated due to the periodic pattern. By predicting a position where reflection is generated on the basis of the positional relations of the periodic pattern and other peripheral patterns and the irradiation angles of the illumination light, the inspection can be carried out at a position where reflection is not generated. <P>COPYRIGHT: (C)2012,JPO&INPIT</p> |
