发明名称 |
Polishing pad and production method thereof |
摘要 |
<p>There are provided a polishing pad which exhibits excellent polishing stability and excellent slurry retainability during polishing and even after dressing, can prevent a reduction in polishing rate effectively and is also excellent in an ability to flatten an substrate to be polished, and a method for producing the polishing pad. The method comprises dispersing water-soluble particles such as beta -cyclodextrin into a crosslinking agent such as a polypropylene glycol so as to obtain a dispersion, mixing the dispersion with a polyisocyanate such as 4,4'-diphenylmethane diisocyanate and/or an isocyanate terminated urethane prepolymer, and reacting the mixed solution so as to obtain a polishing pad having the water-soluble particles dispersed in the matrix.</p> |
申请公布号 |
EP1468785(B1) |
申请公布日期 |
2015.03.18 |
申请号 |
EP20040008869 |
申请日期 |
2004.04.14 |
申请人 |
JSR CORPORATION |
发明人 |
SAKURAI, FUJIO;MIHARA, IWAO;IGARASHI, YOSHINORI;HASEGAWA, KOU |
分类号 |
B24B37/24;B24D3/34;B24D13/14;B24D18/00 |
主分类号 |
B24B37/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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