METHOD OF OBTAINING POSITION, EXPOSURE METHOD, AND METHOD OF MANUFACTURING ARTICLE

摘要

The present invention relates to a method for obtaining the position of a second shot area adjacent to a first shot area among a plurality of shot areas formed on a substrate. The method comprises: a first detection step of detecting a first mark location placed in the first shot area; a second detection step of detecting a mark location which is farther from the first mark among a second mark and a third mark placed in the second shot area; and a determination step of determining the location of the second shot area based on the detection results of the first and second detection steps.