发明名称 |
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM, METHOD OF FORMING PATTERN, PROCESS FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE |
摘要 |
<p>Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (P) comprising any of repeating units (A) of general formula (I) below, each of which contains an ionic structural moiety that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid in a side chain of the resin.</p> |
申请公布号 |
KR20150029673(A) |
申请公布日期 |
2015.03.18 |
申请号 |
KR20157000041 |
申请日期 |
2013.06.27 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
KAWABATA TAKESHI;TSUBAKI HIDEAKI;TAKIZAWA HIROO;YOKOKAWA NATSUMI |
分类号 |
G03F7/004;G03F7/038;G03F7/039;G03F7/32 |
主分类号 |
G03F7/004 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|