发明名称 |
Lithographic printing plate support and presensitized plate |
摘要 |
A lithographic printing plate support includes an aluminum plate and an anodized film formed at a surface of the aluminum plate and having micropores which extend in a depth direction of the anodized aluminum film from a surface of the anodized film opposite from the aluminum plate. Each of the micropores includes a large-diameter portion and a dendritic small-diameter portion. The lithographic printing plate support has excellent scratch resistance and is capable of obtaining a presensitized plate which exhibits excellent on-press developability and enables a lithographic printing plate formed therefrom to have a long press life and excellent deinking ability after suspended printing. |
申请公布号 |
US8978555(B2) |
申请公布日期 |
2015.03.17 |
申请号 |
US201213361700 |
申请日期 |
2012.01.30 |
申请人 |
FUJIFILM Corporation |
发明人 |
Kurokawa Shinya;Miyagawa Yuya;Tagawa Yoshiharu;Nishino Atsuo;Sawada Hirokazu |
分类号 |
B41N1/00;B41N3/03;C25D11/12;C25D11/16;C25D11/24 |
主分类号 |
B41N1/00 |
代理机构 |
Sughrue Mion, PLLC |
代理人 |
Sughrue Mion, PLLC |
主权项 |
1. A lithographic printing plate support comprising: an aluminum plate; and an anodized film formed at a surface of the aluminum plate and having micropores which extend in a depth direction of the anodized film from a surface of the anodized film opposite from the aluminum plate,
wherein each of the micropores has a large-diameter portion which extends to a depth A of 5 to 60 nm from the surface of the anodized film and a dendritic small-diameter portion which communicates with a bottom of the large-diameter portion, and branches off and extends to a depth of 900 to 2,000 nm from a communication position between the small-diameter portion and the large-diameter portion, wherein an aperture average diameter of the large-diameter portion at the surface of the anodized film is from 10 to 100 nm and a ratio of the depth A of the large-sized portion to the aperture average diameter of the large-diameter portion (depth A/aperture average diameter) is from 0.1 to 4.0, wherein a communication position average diameter of the small-diameter portion at the communication position is more than 0 but less than 20 nm, and wherein a ratio of the communication position average diameter of the small-diameter portion to the aperture average diameter of the large-diameter portion (communication position average diameter/aperture average diameter) is up to 0.85. |
地址 |
Tokyo JP |