| 发明名称 | Lithographic apparatus and method | ||
| 摘要 | A lithographic method, among things is disclosed. The method includes using information at least indicative of a desired shape or size of a constituent part of a device to implement the desired shape or size of the constituent part of the device, the desired shape or size being related to a measured property of a layer of material in which the constituent part of the device is to be created, at least a part of the implementation comprising determining a configuration of a plurality of individually controllable elements that would be necessary to create in a radiation beam a pattern which is sufficient to implement the desired shape or size of the constituent part of the device when creating the constituent part of the device. | ||
| 申请公布号 | US8982318(B2) | 申请公布日期 | 2015.03.17 |
| 申请号 | US200912566073 | 申请日期 | 2009.09.24 |
| 申请人 | ASML Netherlands B.V. | 发明人 | Iosad Nikolay Nikolaevich;Gui Cheng-Qun |
| 分类号 | G03F7/20 | 主分类号 | G03F7/20 |
| 代理机构 | Pillsbury Winthrop Shaw Pittman LLP | 代理人 | Pillsbury Winthrop Shaw Pittman LLP |
| 主权项 | 1. A lithographic method, the method comprising: using information at least indicative of a target shape or size of a constituent part of a device to implement the target shape or size of the constituent part of the device, the target shape or size being calculated from a measured materials property of a material of a layer in which the constituent part of the device is to be created and/or of a previous device, and at least a part of the implementation comprising determining a configuration of a plurality of individually controllable elements to create in a radiation beam a pattern which is sufficient to implement the target shape or size of the constituent part of the device when creating the constituent part of the device. | ||
| 地址 | Veldhoven NL | ||