| 发明名称 | Developer | ||
| 摘要 | A developer includes an organic solvent and a nitrogen-containing compound. The developer is configured to develop a resist film to form a negative resist pattern. The resist film is formed using a photoresist composition. The photoresist composition includes a polymer and a radiation-sensitive acid generator. The polymer includes a structural unit including an acid-labile group. | ||
| 申请公布号 | US8980539(B2) | 申请公布日期 | 2015.03.17 |
| 申请号 | US201414190594 | 申请日期 | 2014.02.26 |
| 申请人 | JSR Corporation | 发明人 | Furukawa Taiichi;Sakakibara Hirokazu |
| 分类号 | G03F7/32;G03F7/004;G03F7/039;G03F7/20 | 主分类号 | G03F7/32 |
| 代理机构 | Oblon, McClelland, Maier & Neustadt, L.L.P. | 代理人 | Oblon, McClelland, Maier & Neustadt, L.L.P. |
| 主权项 | 1. A developer comprising: an organic solvent comprising an ester compound; and a nitrogen-containing compound, the developer being configured to develop a resist film to form a negative resist pattern, the resist film being formed using a photoresist composition comprising: a polymer that includes a structural unit including an acid-labile group and produced by polymerizing a monomer having an ethylenically unsaturated bond; anda radiation-sensitive acid generator. | ||
| 地址 | Tokyo JP | ||