Film removing method, nozzle for removing film, and film removing device

摘要

A film in a dry state is efficiently dissolved and removed. A film removing method includes steps of moving a nozzle head (10B) close to a soluble film (201) formed on a substrate (200), forming a liquid pool (302) of chemical liquid (300) between the nozzle head (10B) and the film (201) by continuously and simultaneously discharging and sucking the chemical liquid (300) from the nozzle head (10B), and horizontally moving the substrate (100) in a state in which the nozzle head (10B) and the surface of the film (201) are not contacted so as to relatively move the liquid pool (302) of the chemical liquid on the substrate (100).

主权项

1. A film removing method comprising steps of:
moving a nozzle head close to a soluble film formed on a substrate; forming a liquid pool of chemical liquid between the nozzle head and the film by continuously and simultaneously discharging and sucking the chemical liquid from the nozzle head; and removing the film by horizontally moving the substrate in a state in which the nozzle head and a surface of the film are not contacted so as to relatively move the liquid pool of the chemical liquid on the substrate, wherein the step of forming the liquid pool controls an amount of the chemical liquid which is supplied to the nozzle head in such a manner that the amount is within a predetermined range so that the liquid pool intermittently contacts the surface of the film.