| 发明名称 | Polishing pad, production method for same, and production method for glass substrate | ||
| 摘要 | A polishing pad having a polishing layer comprising a thermoset polyurethane foam, wherein about the thermoset polyurethane foam, the Asker C hardness value thereof is 82 or less as a 60-second value, the hardness value being a value after the foam is immersed in water for 24 hours, and further the value of the tensile storage modulus E′ (30° C.) thereof at a frequency of 1.6 Hz satisfies the following expression (1): Y<5X−150 (1) wherein Y represents the tensile storage modulus E′ (MPa), and X represents the Asker C hardness value (60-second value) after the foam is immersed in water for 24 hours. | ||
| 申请公布号 | US8979611(B2) | 申请公布日期 | 2015.03.17 |
| 申请号 | US201113696759 | 申请日期 | 2011.03.22 |
| 申请人 | Toyo Tire & Rubber Co., Ltd. | 发明人 | Sato Akinori;Ishizaka Nobuyoshi |
| 分类号 | B24D11/00;B24B37/24;B24B7/24 | 主分类号 | B24D11/00 |
| 代理机构 | Morrison & Foerster LLP | 代理人 | Morrison & Foerster LLP |
| 主权项 | 1. A polishing pad having a polishing layer comprising a thermoset polyurethane foam, wherein about the thermoset polyurethane foam, the Asker C hardness value thereof is 82 or less as a 60-second value, the hardness value being a value after the foam is immersed in water for 24 hours, and further the value of the tensile storage modulus E′ (30° C.) thereof at a frequency of 1.6 Hz satisfies the following expression (1): Y<5X−150 (1)wherein Y represents the tensile storage modulus E′ (MPa), and X represents the Asker C hardness value (60-second value) after the foam is immersed in water for 24 hours. | ||
| 地址 | Osaka JP | ||