| 发明名称 | System for detecting motion, lithographic apparatus and device manufacturing method | ||
| 摘要 | A system for detecting motion of a body, the system comprising: a body; a first grating mounted substantially stationary relative to a frame of reference; a second grating mounted on the body; a detector arranged to receive one or more radiation beams diffracted at the first and second gratings thereby to detect motion of the body relative to the frame of reference; wherein the detector is coupled to the body and moveable relative to the body. | ||
| 申请公布号 | US8982359(B2) | 申请公布日期 | 2015.03.17 |
| 申请号 | US201213564665 | 申请日期 | 2012.08.01 |
| 申请人 | ASML Netherlands B.V. | 发明人 | Van Eijk Jan;Loopstra Erik Roelof;Van Der Pasch Engelbertus Antonius Fransiscus;Vermeulen Johannes Petrus Martinus Bernardus |
| 分类号 | G01B11/14;G01B11/24;G01D5/38;G03F7/20 | 主分类号 | G01B11/14 |
| 代理机构 | Sterne, Kessler, Goldstein & Fox P.L.L.C. | 代理人 | Sterne, Kessler, Goldstein & Fox P.L.L.C. |
| 主权项 | 1. A system for detecting motion of a body, the system comprising: a body comprising a first module and a second module, the first module being moveable relative to the second module; a first grating configured to be stationary relative to a frame of reference; a second grating mounted on the first module; and a detector configured to receive one or more radiation beams diffracted from the first and second gratings to detect motion of the body relative to the frame of reference, wherein the detector is coupled to the body and moveable relative to the body. | ||
| 地址 | Veldhoven NL | ||