| 摘要 |
<p>The present invention provides a substrate deposition device which can suppress particles generated during a deposition process of a substrate from being introduced into a deposition region of the substrate. The substrate deposition device according to the present invention comprises: a tray in which a substrate is mounted; a chamber including a process chamber in which a deposition process of the substrate is performed and a guide chamber in which a guide unit to guide the linear transfer of the tray is received and which is partitioned from the process chamber; a partition unit disposed inside the chamber to partition the process chamber and the guide chamber and having a guide slit to form a connection space between the tray and the guide unit; and a blocking unit disposed adjacent to the guide slit to block the mutual movement of particles generated in the process chamber and the guide chamber. Therefore, the device of the present invention can manufacture a high-quality substrate by suppressing the particles generated during the transfer of the substrate from being introduced into the deposition region of the substrate.</p> |
