Liner assembly for chemical vapor deposition chamber

摘要

Embodiments described herein relate to an apparatus and method for lining a processing region within a chamber. In one embodiment, a modular liner assembly for a substrate processing chamber is provided. The modular liner assembly includes a first liner and a second liner, each of the first liner and second liner comprising an annular body sized to be received in a processing volume of a chamber, and at least a third liner comprising a body that extends through the first liner and the second liner, the third liner having a first end disposed in the process volume and a second end disposed outside of the chamber.

主权项

1. A modular liner assembly for a substrate processing chamber, comprising:
a first liner comprising an annular body sized to be received in a processing volume of a chamber, the first liner having two recessed portions formed between a cut-out portion formed in the annular body; a second liner comprising an annular body sized to be received in the processing volume of the chamber, the second liner contacting the first liner; and at least a third liner comprising a body that extends through the first liner and the second liner, the third liner having a first end disposed in the process volume and a second end disposed outside of the chamber, wherein one of the two recessed portions receives a portion of the third liner.