发明名称 GaN-based Schottky diode having partially recessed anode
摘要 A semiconductor device such as a Schottky diode is provided which includes a substrate, a first active layer disposed over the substrate and a second active layer disposed on the first active layer. The second active layer has a higher bandgap than the first active layer such that a two-dimensional electron gas layer arises between the first active layer and the second active layer. A first electrode has a first portion disposed in a recess in the second active layer and a second portion disposed on the second active layer such that a Schottky junction is formed therewith. A second electrode is in contact with the first active layer. The second electrode establishes an ohmic junction with the first active layer.
申请公布号 US8981528(B2) 申请公布日期 2015.03.17
申请号 US201213678570 申请日期 2012.11.16
申请人 Vishay General Semiconductor LLC 发明人 Lin Yih-Yin
分类号 H01L29/66;H01L29/872;H01L29/20 主分类号 H01L29/66
代理机构 Mayer & Williams PC 代理人 Mayer Stuart H.;Williams Karin L.;Mayer & Williams PC
主权项 1. A semiconductor device, comprising: a substrate; a first active layer disposed over the substrate; a second active layer disposed on the first active layer, the second active layer having a higher bandgap than the first active layer such that a two-dimensional electron gas layer arises between the first active layer and the second active layer; a first electrode having a first portion disposed in a recess in the second active layer such that said second active layer is completely removed below the first portion of said first electrode, and a second portion disposed directly on the second active layer such that a Schottky junction is formed therewith, said first portion of the first electrode having a lower Schottky potential barrier than said second portion of the first electrode; and a second electrode in contact with the first active layer, said second electrode establishing an ohmic junction with the first active layer.
地址 Hauppauge NY US