| 摘要 |
<p>PURPOSE: A substrate processing apparatus is provided to prevent a substrate from being separated from a receiving part of a susceptor by determining the position change of the susceptor. CONSTITUTION: A substrate support member(110) includes a substrate holder(114), a susceptor(118), and a rotation shaft(120). A driver(125) provides rotary power to the susceptor. A heater(140) heats a substrate(W) supported by the substrate holder. An exhaust unit(160) includes an exhaust line(163), a valve(165), and a pump(168). A gas spray unit(200) includes a supply line(210), a main line(220), and a spray hole(230).</p> |
