Lithographic apparatus and method

摘要

A detector to measure a property of radiation is disclosed. The detector comprises first and second luminescent uniaxial crystals each having an optic axis, the optic axis of the first uniaxial crystal being arranged such that it is substantially perpendicular to the optic axis of the second uniaxial crystal.

主权项

1. A lithographic apparatus comprising:
a substrate table to hold a substrate; a projection system to project a patterned radiation beam onto a target portion of the substrate; and a detector configured to measure a property of the radiation, the detector comprising first and second luminescent uniaxial crystals each having a crystal optic axis, the crystal optic axis of the second uniaxial crystal being arranged such that it is substantially perpendicular to the crystal optic axis of the first uniaxial crystal, wherein the detector does not substantially change the radiation from a polarized state to an unpolarized state, from an unpolarized state to a polarized state or from a particular polarized state to a different polarized state.