Multiple nozzle gas cluster ion beam system

摘要

Disclosed is a multi-nozzle and skimmer assembly for introducing a process gas mixture, or multiple process gases mixtures, in a gas cluster ion beam (GCIB) system, and associated methods of operation to grow, modify, deposit, or dope a layer upon a substrate. The multiple nozzle and skimmer assembly includes at least two nozzles arranged in mutual close proximity to at least partially coalesce the gas cluster beams emitted therefrom into a single gas cluster beam and/or angled to converge each beam toward a single intersecting point to form a set of intersecting gas cluster beams, and to direct the single and/or intersecting gas cluster beam into a gas skimmer.

主权项

1. A nozzle and skimmer assembly for a gas cluster ion beam (GCIB) system, comprising:
a gas skimmer, a set of at least two nozzles for forming and emitting gas clusters beams, the set of at least two nozzles arranged in mutual close proximity to at least partially coalesce the gas cluster beams emitted from the set of at least two nozzles into a single gas cluster beam and to direct the single gas cluster beam into the gas skimmer, a first gas supply in fluid communication with a first subset of nozzles, the first subset of nozzles comprising at least one nozzle from the set of at least two nozzles, and a second gas supply in fluid communication with a second subset of nozzles, the second subset of nozzles being different than the first subset of nozzles and comprising at least one nozzle from the set of at least two nozzles, wherein the first gas supply is configured to supply a first gas mixture, the second gas supply is configured to supply a second gas mixture, and the first gas mixture and second gas mixture are different.