发明名称 SUPPORTING UNIT AND APPARATUS FOR TREATING SUBSTRATE
摘要 <p>Provided is a supporting unit supporting a substrate. The supporting unit includes a body including a plurality of heating regions and disposed with the substrate on a top surface thereof and a heating unit heating the body. Herein, the heating unit includes heating lines provided in the plurality of heating regions, respectively, to control temperatures of the plurality of heating regions independently from one another, terminals provided to the body and receiving power from the outside, and connecting lines connecting the heating lines to the terminals mutually corresponding to one another. Also, the terminals may be disposed in one of the plurality of heating regions.</p>
申请公布号 KR101502853(B1) 申请公布日期 2015.03.17
申请号 KR20130123464 申请日期 2013.10.16
申请人 发明人
分类号 H01L21/3065;H01L21/683 主分类号 H01L21/3065
代理机构 代理人
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