发明名称 |
Very high power laser chamber optical improvements |
摘要 |
An aspect of the disclosed subject matter includes a method of reducing the laser absorption of a beam reverser prism consisting of at least one of the following: increasing a first distance between a first incident point and a chamfered corner, wherein the first incident point is on a first reflective surface of the prism and the chamfered corner is formed between the first reflective surface and a second reflective surface of the prism, wherein the chamfered corner has a chamfered surface; increasing a second distance between a second incident point and the chamfered corner, wherein the second incident point is on the second reflective surface of the prism; and increasing a reflectivity of the chamfered surface of the chamfered corner of the prism. A method of determining a prime cut for an optical component is also disclosed. A laser including at least one prime cut optical component is also disclosed. |
申请公布号 |
US8982922(B2) |
申请公布日期 |
2015.03.17 |
申请号 |
US201213588170 |
申请日期 |
2012.08.17 |
申请人 |
Cymer, LLC |
发明人 |
Ye Hong;Ershov Alex;Rao Rajasekhar;Brown Daniel;Rokitski Slava;Liu Rong (Lauren);Cybulski Ray;Ferrell James J.;Bergstedt Robert;Viatella John;Duffey Thomas |
分类号 |
H01S3/08;G02B5/04;G02B5/12;H01S3/034;H01S3/00;H01S3/081;H01S3/225 |
主分类号 |
H01S3/08 |
代理机构 |
Martine Penilla Group, LLP |
代理人 |
Martine Penilla Group, LLP |
主权项 |
1. A method of reducing the laser absorption of a beam reverser prism consisting of the following:
increasing a first distance between a first incident point and a chamfered corner, wherein the first incident point is on a first reflective surface of the beam reverser prism and the chamfered corner is disposed between the first reflective surface and a second reflective surface of the prism, wherein the chamfered corner has a chamfered surface and wherein an input laser beam is directed through an input face of the prism to the first incident point, wherein the chamfered corner includes a polished chamfered surface having a finish substantially equal to a reflective surface finish of at least one of the input face, the first reflective surface or the second reflective surface. |
地址 |
San Diego CA US |