发明名称 Lighting apparatus and lighting control system
摘要 Disclosed are a lighting apparatus and a lighting control system. The lighting apparatus includes a heat radiation frame, at least one light emitting device on the heat radiation frame, a diffusion frame provided on the heat radiation frame to protect the at least one light emitting device and diffuse a light emitted from the at least one light emitting device, and a support frame provided under the heat radiation frame and having a receiving space to receive at least one module. The module includes a wireless communication module to transmit or receive a control single of the at least one light emitting device. The power supply module is physically separated from the wireless communication module.
申请公布号 US8981646(B2) 申请公布日期 2015.03.17
申请号 US201313796198 申请日期 2013.03.12
申请人 LG Innotek Co., Ltd. 发明人 Kim Dae Hun
分类号 H01Q1/26;H05B37/02;F21V29/00;F21K99/00;F21V23/00;F21V23/04;H05B33/08;F21Y101/02 主分类号 H01Q1/26
代理机构 Saliwanchik, Lloyd & Eisenschenk 代理人 Saliwanchik, Lloyd & Eisenschenk
主权项 1. A lighting apparatus comprising: a heat radiation frame; a heat radiation plate on the heat radiation frame; at least one light emitting device on the heat radiation plate; a diffusion frame provided on the heat radiation frame to protect the at least one light emitting device and diffuse a light emitted from the at least one light emitting device; and a support frame provided under the heat radiation frame and having a receiving space; a wireless communication module in the receiving space to transmit or receive a control single of the at least one light emitting device; a power supply module in the receiving space to supply a driving power to the at least one light emitting device and the wireless communication module; and an antenna provided on the heat radiation plate and connected with the wireless communication module to transmit or receive the control signal; wherein the power supply module is physically separated from the wireless communication module; wherein the antenna comprises a first pattern extending perpendicularly to the heat radiation plate, and a second pattern extending from the first pattern such that the second pattern is formed horizontally to the heat radiation plate.
地址 Seoul KR