Atomic layer deposition apparatus and method using Xenon flash lamp

摘要

An atomic layer deposition apparatus and a method using a xenon flash lamp are disclosed in the present invention. The atomic layer deposition apparatus using a xenon flash lamp can apply an annealing process only on a thin film of a surface layer where a user wants to carry out the annealing process by conducting the annealing process with momentary radiant heat using the xenon flash lamp.