SELF-ASSEMBLED STRUCTURES, METHOD OF MANUFACTURE THEREOF AND ARTICLES COMPRISING THE SAME

摘要

In the present invention, disclosed is a photoresist composition comprising: a graft block copolymer; a solvent; and a photoacid generating agent. The graft block copolymer includes a first block polymer and a second block polymer. The first block polymer includes a backbone polymer and a first graft polymer, wherein the first graft polymer includes a surface energy reducing unit including a halocarbon unit or a silicon-containing unit. The second block polymer is covalently bonded with a first block, and a second block includes a backbone polymer and a second graft polymer. The second graft polymer includes a functional group in which deprotection is performed so that the solubility of the graft block copolymer can be changed, and the graft block copolymer has bottle brush topology.