发明名称 MANUFACTURING METHOD FOR DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To provide a manufacturing method for a device, capable of preventing reattachment of foreign matter when processing a film for frequency adjustment.SOLUTION: The manufacturing method for a device, having an oscillation element, includes: a first film formation process for forming a first film on the oscillation element; a second film formation process for forming a second film on the oscillation element; a first film processing process for cutting away the first film on the oscillation element; and a second film removal process for removing the second film from the oscillation element.</p>
申请公布号 JP2015050508(A) 申请公布日期 2015.03.16
申请号 JP20130179106 申请日期 2013.08.30
申请人 SEIKO EPSON CORP 发明人 MATSUKAWA NORIHITO
分类号 H03H3/04 主分类号 H03H3/04
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