| 摘要 |
PROBLEM TO BE SOLVED: To provide a film deposition apparatus and a jig capable of measuring the surface temperature of a processed material in deposition, in a low error by using a radiation thermometer.SOLUTION: A film deposition apparatus comprises: a negative electrode member for applying a negative bias voltage for enlarging a sheath layer along the processed surface of a processed material having conductivity, to a material to be worked; a microwave feeding port for transmitting the micro wave for establishing a plasma along the processed surface of the processed material, to an enlarged sheath layer; a jig arranged between at least one of the microwave feeding port and the negative electrode member and attached to the processed material; and a radiation thermometer. Of the jigs to be attached to the processed material, at least one jig has a temperature measurement area to be measured by the radiation thermometer. The measurement face of the temperature measurement area to be measured by the radiation thermometer is constituted to have either an emissivity of a skin to be formed on the treatment surface of the processed material or an emissivity equal to that of the skin. |
