用于原子层沈积之喷射头;INJECTOR HEAD FOR ATOMIC LAYER DEPOSITION

摘要

本发明提供一喷射头，用于在一基板上沈积原子层，包括复数个条状物整体耦接一连接单元。此条状物具有带有一间隔高面之一边墙，个别叠接邻近条状物边墙以形成复数个叠接条状物。条状物包括狭缝延伸一宽度与连接单元的个别狭缝连接。流动路径因而透过条状物定义且具有相对低的摩擦系数以形成个别的前驱物排放管、反应物排放管、或是栅栏气体排放管。间隔高面定义出狭缝并延伸以与连接单元中的对应狭缝沟通。另一流动路径沿着条状物并具有高摩擦系数以形成个别前驱物气体供应、反应物供应管或是流动栅栏气体。; reactant drain or barrier gas drain. The spacer profiles define slits extending between adjacent bars in communication with a respective slot in the connection unit. A further flow path is formed along the bar with a relatively high friction factor, to form a respective precursor gas supply; reactant gas supply or flow barrier.