用于在垂直流电金属沉积之过程中移动一基板固定器之装置及使用此装置于垂直流电金属沉积之方法;DEVICE FOR MOVING A SUBSTRATE HOLDER DURING A VERTICAL GALVANIC METAL DEPOSITION, AND A METHOD FOR VERTICAL GALVANIC METAL DEPOSITION USING SUCH A DEVICE

摘要

本发明系关于用于在至少一待处理基板上之一垂直流电金属(较佳铜)沈积之过程中移动包括此一待处理基板之一基板固定器之装置，其特征在于该装置包括至少一第一驱动构件、至少一第二驱动构件、至少一第一调整构件及至少一第二调整构件；其中该第一驱动构件操作地连接至该第一调整构件以产生一第一轴向偏转，且该第二驱动构件操作地连接至该第二调整构件以产生该基板固定器之一第二轴向偏转；其中该第一轴向偏转及该第二轴向偏转系可连续调整及/或可连续控制的。;本发明进一步系关于一种使用此一装置于一基板上之垂直流电金属(较佳铜)沈积之方法。; wherein the first driving means is in operative connection to the first adjusting means to generate a first axial deflection and the second driving means is in operative connection to the second adjusting means to generate a second axial deflection of the substrate holder; wherein said first axial deflection and said second axial deflection are continuously adjustable and/or controllable. ;The invention is further related to a method for vertical galvanic metal, prefera-bly copper, deposition on a substrate using such a device.