DEPOSITION METHOD AND DEPOSITION APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a deposition method capable of stably supplying a material gas.SOLUTION: The deposition method includes: supplying a plurality of monomers into a deposition apparatus by vaporizing in each corresponding vaporizer; and depositing an organic film onto a substrate by vapor deposition polymerization. The deposition method further includes an impurity removal process for removing impurities in at least one material monomer among the plurality of material monomers.