发明名称 UNEVENNESS MEASURING METHOD AND UNEVENNESS MEASURING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an unevenness measuring method that realizes appropriate measurement of unevenness at a display position.SOLUTION: An unevenness measuring method for measuring unevenness at a display position 51 includes the steps of: calculating global statistics information at the display position 51 from each luminance value in a whole region of the display position 51 and calculating a specified range Aa at the luminance value from the global statistics information; calculating designated statistics information in the specified range Aa from each luminance value within the specified range Aa and calculating two thresholds (THand TH) at the luminance value from the designated statistics information; and using the two thresholds to set two kinds of regions of a bright region B and a dark region D at the display position 51. The set bright region B and dark region D are detected as unevenness at the display position 51.
申请公布号 JP2015049095(A) 申请公布日期 2015.03.16
申请号 JP20130179859 申请日期 2013.08.30
申请人 TOPCON TECHNOHOUSE CORP 发明人 WATANABE HIROTO;TOMOMATSU HIDEKAZU;AN SEIICHI
分类号 G01N21/88;G01M11/00;G02F1/13 主分类号 G01N21/88
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