发明名称 APPARATUS AND METHOD FOR INSPECTING DEFECT
摘要 PROBLEM TO BE SOLVED: To provide an apparatus for inspecting defect capable of inspecting a plurality of wavelengths at high speed with an inexpensive configuration.SOLUTION: An apparatus for inspecting defect comprises: a seed light generator 211 including a pulse signal generator and a polarization modulator that outputs pulse light in either one of two polarization states orthogonal to each other while synchronizing with the pulse signal; a wavelength conversion unit 220 including a branch mechanism for branching the pulse light using polarization, and a conversion unit that converts wavelength of each pulse light branched by the branch mechanism into beams of two wavelengths different from each other; illumination optical systems 3a, 3b irradiating the surface of an object to be inspected with the beams of two wavelengths different from each other, converted by the wavelength conversion unit; a detection unit detecting light that is radiated by the illumination optical systems to generate; and a signal processing system including distributors 511a, 511b distributing a signal based on the light detected by the detection unit for each wavelength on the basis of a pulse signal outputted from the pulse signal generator, and a defect determination unit processing the signal based on the light distributed by the distributors to determine the defect.
申请公布号 JP2015049062(A) 申请公布日期 2015.03.16
申请号 JP20130178806 申请日期 2013.08.30
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 URANO YUTA;UENO TAKETO;HAMAMATSU REI;HONDA TOSHIFUMI
分类号 G01N21/956 主分类号 G01N21/956
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