| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an imprint method and an imprint device, for forming a pattern structure with a high degree of accuracy by using a mold and/or a transfer substrate with a mesa structure.SOLUTION: An imprint method using a transfer substrate with a mesa structure includes: a resin supply step; a contact step; a first check step; a hardening step; and a mold release step. In the first check step, presence or absence of protrusion of a molded resin layer to the outside of a convex structure of the transfer substrate is checked for determination of a subsequent step.</p> |
